DocumentCode :
1100798
Title :
Improvement of breakdown voltage of oxide on V-shaped grooves by thermal oxidation and etching
Author :
Sekigawa, T. ; Ishii, K. ; Oka, N. ; Hayashi, Y.
Author_Institution :
Electrotechnical Laboratory, Ibaraki, Japan
Volume :
32
Issue :
7
fYear :
1985
fDate :
7/1/1985 12:00:00 AM
Firstpage :
1359
Lastpage :
1360
Abstract :
In order to make the corners of V-shaped grooves rounded and improve the breakdown voltage of gate oxide there, a method of growing an oxide film on the V-shaped surface and etching it off before the gate oxide growth is proposed. Experiments and theory show its effectiveness.
Keywords :
Breakdown voltage; Diodes; Electron devices; Estimation theory; Etching; Oxidation; Power transistors; Shape; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22126
Filename :
1484872
Link To Document :
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