Title :
Characterization of ultra-high-speed pseudomorphic AlGaAs/InGaAs (on GaAs) MODFETs
Author :
Nguyen, Loi D. ; Tasker, Paul J. ; Radulescu, David C. ; Eastman, Lester F.
Author_Institution :
Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
fDate :
10/1/1989 12:00:00 AM
Abstract :
The authors report a detailed characterization of ultrahigh-speed pseudomorphic AlGaAs/InGaAs (on GaAs) modulation-doped field-effect transistors (MODFETs) with emphasis on the device switching characteristics. The nominal 0.1-μm gate-length device exhibit a current gain cutoff frequency (ft) as high as 152 GHz. This value of ft corresponds to a total delay of approximately 1.0 ps and is attributed to the optimization of layer structure, device layout, and fabrication process. It is shown that the electron transit time in these very short gate-length devices still accounts for approximately 60% of the total delay, and, as a result, significant improvements in switching speed are possible with further reductions of gate length. The results reported clearly demonstrate the potential of the pseudomorphic AlGaAs/InGaAs MODFET as an ultrahigh-speed device. Its excellent switching characteristics are attributed to the high saturation velocity (~2×107 cm/s), 2DEG sheet density (2.5×1012 cm-2), and current drive capability (>200 mA/mm at the peak transconductance)
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor switches; 0.1 micron; 1 ps; 152 GHz; 2DEG sheet density; AlGaAs-InGaAs-GaAs; GaAs; current drive capability; current gain cutoff frequency; delay; electron transit time; gate-length; saturation velocity; switching characteristics; switching speed; ultrahigh speed pseudomorphic MODFET; Cutoff frequency; Delay; Electrons; Epitaxial layers; FETs; Fabrication; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs;
Journal_Title :
Electron Devices, IEEE Transactions on