Nanometre electrode fabrication technology using anodic oxidation resist films and applications to 10 GHz surface acoustic wave devices

New lithography techniques for electrode widths of less than 60 nm are proposed. The electrodes are fabricated by using extremely thin anodic oxidation films (AOFs) as resists. 60 nm-wide electrodes were obtained by using a wet etching technique and 100 nm-wide electrodes by using a dry etching-technique. The experimental results of a 10 GHz surface acoustic wave filter with an insertion loss of 15 dB are also presented for an 80 nm-wide electrode