DocumentCode
1101806
Title
Nanometre electrode fabrication technology using anodic oxidation resist films and applications to 10 GHz surface acoustic wave devices
Author
Yamanouchi, Kazuhiko ; Meguro, Tomomi ; Wagatsuma, Y. ; Odagawa, Hiroyuki ; Yamamoto, Koji
Author_Institution
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai
Volume
30
Issue
12
fYear
1994
fDate
6/9/1994 12:00:00 AM
Firstpage
1010
Lastpage
1011
Abstract
New lithography techniques for electrode widths of less than 60 nm are proposed. The electrodes are fabricated by using extremely thin anodic oxidation films (AOFs) as resists. 60 nm-wide electrodes were obtained by using a wet etching technique and 100 nm-wide electrodes by using a dry etching-technique. The experimental results of a 10 GHz surface acoustic wave filter with an insertion loss of 15 dB are also presented for an 80 nm-wide electrode
Keywords
anodised layers; lithography; microelectrodes; nanotechnology; oxidation; resists; sputter etching; surface acoustic wave devices; 10 GHz; 15 dB; 60 to 100 nm; SAW filter; anodic oxidation resist films; dry etching; lithography techniques; nanometre electrode fabrication technology; surface acoustic wave devices; thin anodic oxidation films; wet etching;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19940631
Filename
293101
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