DocumentCode
1101814
Title
A simple model for predicting contrast in photoresists
Author
Babu, S.V. ; Srinivasan, V.
Author_Institution
Clarkson University, Potsdam, NY
Volume
32
Issue
9
fYear
1985
fDate
9/1/1985 12:00:00 AM
Firstpage
1896
Lastpage
1898
Abstract
A simple model that predicts the contrast of positive and negative photoresists, given the optical absorption of the resist and the spectral emission intensity of the exposing tool, is proposed. Predictions for Kodak-747 Microresist, AZ2400, PR102, and Dupont Elvacite 2041PMMA resists are excellent. The model is equally applicable to exposures involving pulsed excimer laser radiation.
Keywords
Absorption; Equations; Optical films; Optical pulses; Predictive models; Resists; Solvents; Stimulated emission; Substrates; Wavelength measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.22218
Filename
1484964
Link To Document