• DocumentCode
    1102315
  • Title

    Evaluation of base transit time in ultra-thin carbon-doped base InP/lnGaAs heterojunction bipolar transistors

  • Author

    Ito, H. ; Yamahata, S. ; Kurishima, K.

  • Author_Institution
    NTT LSI Labs., Kanagawa, Japan
  • Volume
    32
  • Issue
    15
  • fYear
    1996
  • fDate
    7/18/1996 12:00:00 AM
  • Firstpage
    1413
  • Lastpage
    1415
  • Abstract
    Electron transit times in the carbon-doped base of InP/InGaAs heterojunction bipolar transistors (HBTs) are investigated from the current gains. The base layers were heavily doped to 2.5×1019 cm-3 and the thicknesses WB were varied from 50 to 1300 Å. The estimated base transit time τB shows linear dependence on WB when WB is smaller than 150 Å, whereas it has quadratic dependence on WB above this value. The linear behaviour of τB on W B is evidence of dominant ballistic electron transport in the ultra-thin base layer of InP/InGaAs HBTs
  • Keywords
    III-V semiconductors; carbon; gallium arsenide; heavily doped semiconductors; heterojunction bipolar transistors; indium compounds; InP-InGaAs:C; InP/lnGaAs heterojunction bipolar transistor; ballistic electron transport; current gain; electron transit time; heavily doped layer; ultra-thin carbon-doped base;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19960914
  • Filename
    511154