DocumentCode :
1102345
Title :
Measurement of intrinsic capacitance of lightly doped drain (LDD) MOSFET´s
Author :
Ishiuchi, Hidemi ; Matsumoto, Yasuo ; Sawada, Shizuo ; Ozawa, Osamu
Author_Institution :
Toshiba Corporation, Kawasaki, Japan
Volume :
32
Issue :
11
fYear :
1985
fDate :
11/1/1985 12:00:00 AM
Firstpage :
2238
Lastpage :
2242
Abstract :
Intrinsic capacitance of lightly doped drain (LDD) MOSFET´s is measured by means of a four-terminal method without using any on-chip measurement circuits. The gate-to-drain capacitance Cgdof LDD MOSFET´s is smaller than that of conventional MOSFET´s in the saturation region. The technique is applied to determine the effective channel length.
Keywords :
Capacitance measurement; Circuit simulation; Coaxial components; Condition monitoring; Helium; Length measurement; MOSFET circuits; Probes; Semiconductor device noise; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22264
Filename :
1485010
Link To Document :
بازگشت