DocumentCode :
1102752
Title :
Modeling heavy implants in amorphous substrates
Author :
Cerofolini, Gianfranco F. ; Meda, Laura ; Polignano, M.L. ; Queirolo, Giuseppe
Author_Institution :
SGS-Microelectronica S.p.A, Milan, Italy
Volume :
32
Issue :
11
fYear :
1985
fDate :
11/1/1985 12:00:00 AM
Firstpage :
2495
Lastpage :
2502
Abstract :
A model to calculate implanted profiles for implants at fluences higher than 1015cm-2is proposed. Such a model takes into account sputtering, self-sputtering, and change of stopping power. The consideration of one parameter more than the ones of the original Lindhard-Scharff-Schiøtt theory leads to significant deviations from the original picture.
Keywords :
Amorphous materials; Atomic layer deposition; Implants; Power generation economics; Semiconductor process modeling; Silicon on insulator technology; Sputtering; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22301
Filename :
1485047
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1102752
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