DocumentCode :
1102819
Title :
Short-channel effects in subquarter-micrometer-gate HEMTs: simulation and experiment
Author :
Awano, Yuji ; Kosugi, Makoto ; Kosemura, Kinjiro ; Mimura, Takashi ; Abe, Masayuki
Author_Institution :
Fujitsu Lab. Ltd., Atsugi, Japan
Volume :
36
Issue :
10
fYear :
1989
fDate :
10/1/1989 12:00:00 AM
Firstpage :
2260
Lastpage :
2266
Abstract :
The authors studied the electrical properties of subquarter-micrometer-gate HEMTs (high electron mobility transistors) by Monte Carlo simulation and experiment. Simulation shows that subquarter-micrometer-gate HEMTs have extremely high performance, and the near-ballistic movement under the gate was confirmed. It is also shown that the aspect ratio of the channel could be used as a guide to determine the extent of short-channel effects. The transverse-domain formation inherent in short-channel HEMTs may also contribute to the smaller short-channel effect by limiting undesirable substrate current. Experimentally, only a negligible short-channel effect was observed when the gate length was reduced from 1.25 to 0.14 μm. Thus it is not necessary to design and fabricate a special structure for HEMTs, as such a structure might have limited applications
Keywords :
Monte Carlo methods; high electron mobility transistors; semiconductor device models; 0.14 to 1.25 micron; HEMTs; Monte Carlo simulation; aspect ratio; electrical properties; gate length; high electron mobility transistors; near-ballistic movement; short-channel effects; substrate current; transverse-domain formation; Circuit simulation; Electrons; FETs; Fabrication; Gallium arsenide; HEMTs; Length measurement; MESFETs; MODFETs; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.40908
Filename :
40908
Link To Document :
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