Title :
IIB-3 defect-free selective epitaxial technology for fine isolation
Author :
Kasai, Naoki ; Kitajima, H. ; Ishitani, A.
fDate :
11/1/1985 12:00:00 AM
Keywords :
Boron; CMOS technology; Etching; Filling; Graphics; Insulation; Isolation technology; Microelectronics; National electric code; Substrates;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1985.22317
