DocumentCode

1102935

Title

IIB-3 defect-free selective epitaxial technology for fine isolation

Author

Kasai, Naoki ; Kitajima, H. ; Ishitani, A.

Volume

32

Issue

11

fYear

1985

fDate

11/1/1985 12:00:00 AM

Firstpage

2531

Lastpage

2532

Keywords

Boron; CMOS technology; Etching; Filling; Graphics; Insulation; Isolation technology; Microelectronics; National electric code; Substrates;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1985.22317

Filename

1485063