DocumentCode
1102944
Title
IIB-2 process-dependent properties of three-dimensional capacitors
Author
Koburger, C. ; White, Frank ; Nesbit, L. ; Emmanuel, Sabu
Volume
32
Issue
11
fYear
1985
fDate
11/1/1985 12:00:00 AM
Firstpage
2531
Lastpage
2531
Keywords
Degradation; Electron devices; Etching; Filling; Isolation technology; MOS capacitors; National electric code; Plasma displays; Plasma properties; Surface topography;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.22318
Filename
1485064
Link To Document