• DocumentCode
    1102951
  • Title

    IIB-5 ultrashallow p+-n junctions suitable for VLSI CMOS

  • Author

    Sigmon, T.W.

  • Volume
    32
  • Issue
    11
  • fYear
    1985
  • fDate
    11/1/1985 12:00:00 AM
  • Firstpage
    2532
  • Lastpage
    2533
  • Keywords
    Boron; Fabrication; Gas lasers; Implants; Ion implantation; Resists; Surface cleaning; Tail; Thermal resistance; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22319
  • Filename
    1485065