DocumentCode

1102961

Title

IIB-4 CMOS well drive-in NH3for reduced lateral diffusion and heat cycle

Author

Wong, S. Simon

Volume

32

Issue

11

fYear

1985

fDate

11/1/1985 12:00:00 AM

Firstpage

2532

Lastpage

2532

Keywords

Boron; FETs; Fabrication; Gas lasers; Implants; Ion implantation; Resists; Tail; Thermal resistance; Very large scale integration;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1985.22320

Filename

1485066