DocumentCode :
1102974
Title :
IIB-7 rapid thermal annealing implant diffusion for 1000-Å source-drain junctions
Author :
Davies, D.E.
Volume :
32
Issue :
11
fYear :
1985
fDate :
11/1/1985 12:00:00 AM
Firstpage :
2533
Lastpage :
2533
Keywords :
Diodes; Implants; Optical arrays; Optical recording; Phased arrays; Pressing; Rapid thermal annealing; Semiconductor laser arrays; Solid state circuits; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22321
Filename :
1485067
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1102974
بازگشت