• DocumentCode
    1103264
  • Title

    IVB-3 dynamic trapping-detrapping phenomena in thermal SiO2

  • Author

    Nissan-Cohen, Y. ; Shappir, Joseph ; Frohman-Bentchkowsky, D.

  • Volume
    32
  • Issue
    11
  • fYear
    1985
  • fDate
    11/1/1985 12:00:00 AM
  • Firstpage
    2542
  • Lastpage
    2543
  • Keywords
    CMOS technology; Charge measurement; Circuits; Current measurement; Electron traps; Impact ionization; MOSFETs; Semiconductor device modeling; Silicon; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22347
  • Filename
    1485093