DocumentCode
1103411
Title
Analysis of the temperature dependence of hot-carrier-induced degradation in bipolar transistors for Bi-CMOS
Author
Momose, Hisayo Sasaki ; Iwai, Hiroshi
Author_Institution
ULSI Res. Center, Toshiba Corp., Kawasaki, Japan
Volume
41
Issue
6
fYear
1994
fDate
6/1/1994 12:00:00 AM
Firstpage
978
Lastpage
987
Abstract
The temperature dependence of emitter-base reverse stress degradation in bipolar transistors for Bi-CMOS circuits was studied. A suitable measure of degradation in the operating temperature range was chosen after careful consideration of the fact that bipolar transistor characteristics are very sensitive to temperature changes. The worst-case temperature conditions within the transistors´ operating range were determined. Degradation was found to be worst at around 50°C-a result of a tradeoff between thermal recovery from degradation and the effects of bandgap narrowing on bipolar characteristics. The recovery phenomena which had taken place after degradation were also investigated in detail
Keywords
BiCMOS integrated circuits; bipolar transistors; hot carriers; 50 C; BiCMOS circuits; bandgap narrowing; bipolar transistors; emitter-base reverse stress degradation; hot-carrier-induced degradation; temperature dependence; thermal recovery; worst-case temperature conditions; Bipolar transistors; Circuits; Delay; Hot carrier injection; Hot carriers; Stress; Temperature dependence; Temperature distribution; Temperature sensors; Thermal degradation;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.293311
Filename
293311
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