• DocumentCode
    1103411
  • Title

    Analysis of the temperature dependence of hot-carrier-induced degradation in bipolar transistors for Bi-CMOS

  • Author

    Momose, Hisayo Sasaki ; Iwai, Hiroshi

  • Author_Institution
    ULSI Res. Center, Toshiba Corp., Kawasaki, Japan
  • Volume
    41
  • Issue
    6
  • fYear
    1994
  • fDate
    6/1/1994 12:00:00 AM
  • Firstpage
    978
  • Lastpage
    987
  • Abstract
    The temperature dependence of emitter-base reverse stress degradation in bipolar transistors for Bi-CMOS circuits was studied. A suitable measure of degradation in the operating temperature range was chosen after careful consideration of the fact that bipolar transistor characteristics are very sensitive to temperature changes. The worst-case temperature conditions within the transistors´ operating range were determined. Degradation was found to be worst at around 50°C-a result of a tradeoff between thermal recovery from degradation and the effects of bandgap narrowing on bipolar characteristics. The recovery phenomena which had taken place after degradation were also investigated in detail
  • Keywords
    BiCMOS integrated circuits; bipolar transistors; hot carriers; 50 C; BiCMOS circuits; bandgap narrowing; bipolar transistors; emitter-base reverse stress degradation; hot-carrier-induced degradation; temperature dependence; thermal recovery; worst-case temperature conditions; Bipolar transistors; Circuits; Delay; Hot carrier injection; Hot carriers; Stress; Temperature dependence; Temperature distribution; Temperature sensors; Thermal degradation;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.293311
  • Filename
    293311