DocumentCode :
1103593
Title :
VIB-4 the effect of channel length and gate oxide thickness on the performance of insulated gate transistors
Author :
Chow, T.P. ; Baliga, B. Jayant ; Chang, M.F.
Volume :
32
Issue :
11
fYear :
1985
fDate :
11/1/1985 12:00:00 AM
Firstpage :
2554
Lastpage :
2554
Keywords :
Conductivity; Current measurement; Doping; Electron devices; Insulation; MOSFET circuits; Power MOSFET; Power electronics; Power transistors; Testing;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22377
Filename :
1485123
Link To Document :
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