• DocumentCode
    1104044
  • Title

    A novel GaAs Schottky-drain power FET for microwave application

  • Author

    Calviello, Joseph A. ; Bie, Paul R. ; Pomian, Ronald J. ; Cappello, Anthony

  • Author_Institution
    Eaton Coporation, Melville, NY
  • Volume
    32
  • Issue
    12
  • fYear
    1985
  • fDate
    12/1/1985 12:00:00 AM
  • Firstpage
    2844
  • Lastpage
    2847
  • Abstract
    A GaAs Schottky-drain [1] power FET (SDFET) having a 2.4-mm gate periphery and 1.5-µm gate length has been developed, and it realized excellent performance at 10 GHz. This includes an output power in excess of 1 W and 36-percent power-added efficiency (PAE). These devices were fabricated on epitaxial layers grown on 2-µm-thick buffer layers using vapor-phase epitaxy. With the exception of the mesa and recess channels, which were defined by conventional chemical etch, the devices were processed by the plasma dry-etch technique. For the Schottky junctions and source ohmic contacts, we used tantalum with a thick gold overlayer and GeAu, respectively.
  • Keywords
    Buffer layers; Chemical processes; Dry etching; Epitaxial growth; Epitaxial layers; Gallium arsenide; Microwave FETs; Microwave devices; Plasma applications; Power generation;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22425
  • Filename
    1485171