• DocumentCode
    1104120
  • Title

    A four-vacuum-cycle lift-off process for the polycrystalline CdSe thin-film transistor

  • Author

    Vanfleteren, J. ; Van Calster, A.

  • Author_Institution
    Ghent State University, Belgium
  • Volume
    6
  • Issue
    1
  • fYear
    1985
  • fDate
    1/1/1985 12:00:00 AM
  • Firstpage
    11
  • Lastpage
    13
  • Abstract
    A photolithographic process is described for the fabrication of the polycrystalline CdSe thin-film transistor (TFT). This process only uses four vacuum cycles and four lift-off masks, without the need of sputter cleaning to prevent contamination. The devices made have a stability similar to the ones made by the single-vacuum process.
  • Keywords
    Annealing; Cleaning; Contamination; Fabrication; Isolators; Resists; Sandwich structures; Semiconductor films; Substrates; Thin film transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1985.26025
  • Filename
    1485178
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1104120