DocumentCode :
1104149
Title :
A new Ga0.47In0.53As field-effect transistor with a lattice-mismatched GaAs gate for high-speed circuits
Author :
Chen, C.Y. ; Cho, A.Y. ; Garbinski, P.A.
Author_Institution :
AT&T Bell Laboratories, Murray Hill, NJ
Volume :
6
Issue :
1
fYear :
1985
fDate :
1/1/1985 12:00:00 AM
Firstpage :
20
Lastpage :
21
Abstract :
A novel thin GaAs lattice-mismatched gate Ga0.47In0.53As field-effect transistor (LMG-FET) is reported. The device shows an extrinsic dc transconductance of 108 mS/mm for a 1.4-µm gate length and 240-µm gate width. Despite a 3.7-percent, lattice mismatch between GaAs and Ga0.47In0.53As, the LMG-FET shows stable operation even at 80°C (with a 13-percent increase in transconductances), exhibits negligible current drift, and suffers very little change in threshold voltages (<0.05 V) under illumination, This technology may find applications in high-speed lightwave transmission as well as high-speed digital circuits.
Keywords :
Contact resistance; Electrical resistance measurement; Electron mobility; Gallium arsenide; Intrusion detection; Lattices; Leakage current; Lighting; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26028
Filename :
1485181
Link To Document :
بازگشت