DocumentCode
1104452
Title
InGaN/GaN multi-quantum-well planar metal-semiconductor-metal light-emitting diodes
Author
Miao, C. ; Lu, H. ; Du, X.Z. ; Li, Y. ; Zhang, R. ; Zheng, Y.D.
Author_Institution
Nanjing Univ., Nanjing
Volume
44
Issue
6
fYear
2008
Firstpage
441
Lastpage
442
Abstract
Planar metal-semiconductor-metal light-emitting diodes with InGaN/GaN multi-quantum-wells (MQWs) as the active layer have been demonstrated for the first time. The diodes with interdigitated Schottky electrodes fabricated on p-GaN contact layer exhibit symmetrical current-voltage characteristic with a turn-on voltage of ~ 13 V at 20 mA. The violet light emission centred at 408 nm is generated by radiative recombination taking place in the MQWs. The evolution of light output power against injection current reveals an enhanced carrier collecting efficiency of the active MQWs at higher injection current level, which follows a P prop I2.8 trend below 30 mA.
Keywords
gallium compounds; indium compounds; light emitting diodes; metal-semiconductor-metal structures; quantum well devices; InGaN-GaN; Schottky electrodes; current 20 mA; injection current level; light-emitting diodes; multi-quantum-wells; planar metal-semiconductor-metal structures; radiative recombination; wavelength 408 nm;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20083579
Filename
4472430
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