• DocumentCode
    1104452
  • Title

    InGaN/GaN multi-quantum-well planar metal-semiconductor-metal light-emitting diodes

  • Author

    Miao, C. ; Lu, H. ; Du, X.Z. ; Li, Y. ; Zhang, R. ; Zheng, Y.D.

  • Author_Institution
    Nanjing Univ., Nanjing
  • Volume
    44
  • Issue
    6
  • fYear
    2008
  • Firstpage
    441
  • Lastpage
    442
  • Abstract
    Planar metal-semiconductor-metal light-emitting diodes with InGaN/GaN multi-quantum-wells (MQWs) as the active layer have been demonstrated for the first time. The diodes with interdigitated Schottky electrodes fabricated on p-GaN contact layer exhibit symmetrical current-voltage characteristic with a turn-on voltage of ~ 13 V at 20 mA. The violet light emission centred at 408 nm is generated by radiative recombination taking place in the MQWs. The evolution of light output power against injection current reveals an enhanced carrier collecting efficiency of the active MQWs at higher injection current level, which follows a P prop I2.8 trend below 30 mA.
  • Keywords
    gallium compounds; indium compounds; light emitting diodes; metal-semiconductor-metal structures; quantum well devices; InGaN-GaN; Schottky electrodes; current 20 mA; injection current level; light-emitting diodes; multi-quantum-wells; planar metal-semiconductor-metal structures; radiative recombination; wavelength 408 nm;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20083579
  • Filename
    4472430