DocumentCode :
1104736
Title :
Carrier separation effects in hydrogenated amorphous silicon photoconductors with multilayer structures
Author :
Sakata, I. ; Hayashi, Y. ; Yamanaka, M. ; Satoh, M.
Author_Institution :
Electrotechnical Laboratory, Ibaraki, Japan
Volume :
6
Issue :
4
fYear :
1985
fDate :
4/1/1985 12:00:00 AM
Firstpage :
166
Lastpage :
168
Abstract :
Photogenerated electrons and holes can be separated efficiently by the built-in field present in hydrogenated amorphous silicon (a-Si:H) photoconductors with multilayer (ML) structures. Because of the carrier separation, the recombination rate of photogenerated carrier´s decreases and this can lead to high photosensitivity and small photoinduced changes in a-Si:H ML photoconductors. We have observed that such carrier separation effects indeed occur in a-Si:H p-i-p type ML photoconductors. Some comments are made on the origin of the photoinduced changes in a-Si:H from the experimental results obtained for the p-i-p type photoconductors.
Keywords :
Amorphous silicon; Charge carrier processes; Contacts; Detectors; Electrodes; Nonhomogeneous media; Photoconductivity; Radiative recombination; Spontaneous emission; Stability;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26084
Filename :
1485237
Link To Document :
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