DocumentCode
1105021
Title
Comparison of the saturated current in normal and inverted modulation-doped In0.53 Ga0.47 As/InP structures
Author
Chan, W.K. ; Cox, H.M. ; Hummel, S.G. ; Davisson, P.S. ; Leheny, R.F.
Author_Institution
Bell Communications Research, Inc., Murray Hill, NJ
Volume
6
Issue
5
fYear
1985
fDate
5/1/1985 12:00:00 AM
Firstpage
247
Lastpage
249
Abstract
We measured the saturated current in both normal (doping layer on top) and inverted (doping layer on bottom) structures of modulation-doped In0.53 Ga0.47 As/InP. In the inverted structure, we find a saturated current consistent with the low-field carrier density and the bulk electron saturated velocity; but for the normal structure the saturated current is significantly lower than expected. Measurements indicate that this low saturation current is due to a loss of carriers at high fields.
Keywords
Charge carrier density; Current measurement; Doping; Electron mobility; Epitaxial layers; FETs; HEMTs; Indium phosphide; Substrates; Testing;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1985.26113
Filename
1485266
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