Title :
Simulated performance of a contrast-enhancement material
Author_Institution :
Hewlett Packard Laboratories, Palo Alto, CA
fDate :
6/1/1985 12:00:00 AM
Abstract :
SAMPLE simulations of the performance of the contrast-enhancement material CEM-388 from General Electric were made using measured material parameters. Addition of an enhancement layer to a single-layer resist process significantly reduces the linewidth variations due to the standing-wave effect. Addition of an enhancement layer to a bilevel resist process containing dye in the bottom layer marginally improves defocus performance.
Keywords :
Absorption; Electric variables measurement; Inhibitors; Lenses; Measurement units; Optical imaging; Optical materials; Resins; Resists; Velocity measurement;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1985.26126
