• DocumentCode
    1105151
  • Title

    Simulated performance of a contrast-enhancement material

  • Author

    O´Toole, M.M.

  • Author_Institution
    Hewlett Packard Laboratories, Palo Alto, CA
  • Volume
    6
  • Issue
    6
  • fYear
    1985
  • fDate
    6/1/1985 12:00:00 AM
  • Firstpage
    282
  • Lastpage
    284
  • Abstract
    SAMPLE simulations of the performance of the contrast-enhancement material CEM-388 from General Electric were made using measured material parameters. Addition of an enhancement layer to a single-layer resist process significantly reduces the linewidth variations due to the standing-wave effect. Addition of an enhancement layer to a bilevel resist process containing dye in the bottom layer marginally improves defocus performance.
  • Keywords
    Absorption; Electric variables measurement; Inhibitors; Lenses; Measurement units; Optical imaging; Optical materials; Resins; Resists; Velocity measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1985.26126
  • Filename
    1485279
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1105151