DocumentCode
1105360
Title
Visible-laser repair of clear defects in photomasks
Author
Oprysko, M.M. ; Beranek, M.W. ; Young, P.L.
Author_Institution
Gould Research Center, Rolling Meadows, IL
Volume
6
Issue
7
fYear
1985
fDate
7/1/1985 12:00:00 AM
Firstpage
344
Lastpage
346
Abstract
A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming systems, submicrometer repair resolution can be achieved.
Keywords
Argon; Gas lasers; Laser beams; Laser modes; Laser theory; Optical films; Optical surface waves; Power lasers; Pulsed laser deposition; Substrates;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1985.26149
Filename
1485302
Link To Document