Title :
Visible-laser repair of clear defects in photomasks
Author :
Oprysko, M.M. ; Beranek, M.W. ; Young, P.L.
Author_Institution :
Gould Research Center, Rolling Meadows, IL
fDate :
7/1/1985 12:00:00 AM
Abstract :
A method for repairing clear defects in photomasks is demonstrated. A visible (514.5-nm) laser beam focused on a defect area drives a pyrolytic reaction which leaves a metal film on the defect area. Defects as small as 1.6 µm have been successfully repaired. Using currently available laser trimming systems, submicrometer repair resolution can be achieved.
Keywords :
Argon; Gas lasers; Laser beams; Laser modes; Laser theory; Optical films; Optical surface waves; Power lasers; Pulsed laser deposition; Substrates;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1985.26149
