DocumentCode :
1105620
Title :
The effect of MOS Channel length on the performance of insulated gate transistors
Author :
Chow, T.P. ; Baliga, B.J.
Author_Institution :
General Electric Company, Schenectady, NY
Volume :
6
Issue :
8
fYear :
1985
fDate :
8/1/1985 12:00:00 AM
Firstpage :
413
Lastpage :
415
Abstract :
The effect of MOS channel length on n-channel 600-V insulated gate transistors (IGT´s) is evaluated. When the channel length was decreased from 1.9 to 0.8 µm, a doubling of the forward conduction current was measured at a forward drop of 2 V for IGT´s with a turn-off time of 2 µs. Also, a better forward drop versus turnoff time tradeoff were observed. However, a 25-50-percent decrease in latching current was measured for the short-channel devices under dynamic switching conditions at 150°C.
Keywords :
Boron; Current measurement; Current supplies; Equivalent circuits; Insulation; Length measurement; MOSFET circuits; Power semiconductor switches; Thyristors; Time measurement;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26174
Filename :
1485327
Link To Document :
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