A three-dimensional photoresist image simulator: TRIPS-I

A simulator for a three-dimensional (3-D) photoresist image formation on flat substrates has been developed. Named Three-Dimensional Resist Imaging Process Simulator-I (TRIPS-I), the simulator consists of three subsimulators: one for the two-dimensional (2-D) distribution of projected light intensity, one for 3-D photosensitizer concentration distribution, and one for 3-D photoresist development. In regard to the first two, conventional procedures have been employed. The last, however, involves adoption of a ray tracing model based on the principle of least time.