• DocumentCode
    1105808
  • Title

    18.5-dB Gain at 18 GHz with a GaAs permeable base transistor

  • Author

    Bozler, C.O. ; Hollis, M.A. ; Nichols, K.B. ; Rabe, S. ; Vera, A. ; Chen, C.L.

  • Author_Institution
    Massachusetts Institute of Technology, Lexington, MA
  • Volume
    6
  • Issue
    9
  • fYear
    1985
  • fDate
    9/1/1985 12:00:00 AM
  • Firstpage
    456
  • Lastpage
    458
  • Abstract
    Permeable base transistors have recently been fabricated using organometallic chemical vapor deposition (OMCVD) with a gain of 18.5 dB at 18 GHz. This extrapolates to an f_{\\max } of 150 GHz which is comparable to the best previous result. Secondary ion mass spectrometry (SIMS) analysis shows that there is a large concentration of undesired impurities in the grating region of these recent devices. It is quite probable that better performance can be achieved in future devices if those impurities can be eliminated.
  • Keywords
    Chemical vapor deposition; Doping profiles; Epitaxial growth; Etching; Gain; Gallium arsenide; Gratings; Impurities; Mass spectroscopy; Tungsten;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1985.26191
  • Filename
    1485344