• DocumentCode
    1105863
  • Title

    Very short gate-length GaAs MESFET´s

  • Author

    Patrick, W. ; Mackie, W.S. ; Beaumont, S.P. ; Wilkinson, C.D.W. ; Oxley, C.H.

  • Author_Institution
    Glasgow University, Glasgow, Scotland, U.K.
  • Volume
    6
  • Issue
    9
  • fYear
    1985
  • fDate
    9/1/1985 12:00:00 AM
  • Firstpage
    471
  • Lastpage
    472
  • Abstract
    GaAs MESFET´s with gate lengths ranging from 0.36 µm down to 0.055 µm, the smallest so far reported, have been fabricated using electron-beam lithography. DC output characteristics were obtained from all of the devices tested and transconductances up to 300 mS/mm were measured. However it was observed that there is a maximum drain-source voltage that can be pinched off in these short gate devices. This voltage varies exponentially from 1 V in the 0.055-µm gate devices to 6 V in the 0.36-µm device. It is speculated that this effect is due to current injection into the buffer layer.
  • Keywords
    Annealing; Buffer layers; Etching; Fabrication; Gallium arsenide; Lithography; MESFETs; Ohmic contacts; Resists; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1985.26196
  • Filename
    1485349