Title :
Self-aligned p-channel MISFET with a low-temperature-grown GaAs gate insulator
Author :
Chen, C.L. ; Mahoney, L.J. ; Nichols, K.B. ; Brown, E.R. ; Gramstorff, B.F.
Author_Institution :
Lincoln Lab., MIT, Lexington, MA, USA
Abstract :
A new p-channel GaAs metal-insulator-semiconductor field-effect transistor (MISFET) using low-temperature-grown (LTG) GaAs as the gate insulator is demonstrated. Neither the GaAs conducting channel nor the gate insulator was doped, and a Be self-aligned implant was used to lower the source and drain series resistance. For a MISFET with a 1.5-μm gate length, the transconductance is 22 mS/mm and the maximum drain current is 120 mA/mm obtained at -8 V of gate bias. The measured unity-current-gain cut-off frequency fT is 2.0 GHz.
Keywords :
III-V semiconductors; MISFET; gallium arsenide; -8 V; 1.5 micron; 2.0 GHz; Be implant; GaAs:Be; drain current; low-temperature-grown GaAs gate insulator; self-aligned p-channel MISFET; series resistance; transconductance; unity-current-gain cut-off frequency; Electrical resistance measurement; FETs; Frequency measurement; Gallium arsenide; Implants; Insulation; MISFETs; Measurement units; Metal-insulator structures; Transconductance;
Journal_Title :
Electron Device Letters, IEEE