DocumentCode :
1106903
Title :
Scaling Limits of Double-Gate and Surround-Gate Z-RAM Cells
Author :
Butt, Nauman Z. ; Alam, Muhammad Ashraful
Author_Institution :
Purdue Univ., West Lafayette
Volume :
54
Issue :
9
fYear :
2007
Firstpage :
2255
Lastpage :
2262
Abstract :
We consider the scaling of the capacitorless single-transistor [zero-capacitor RAM (Z-RAM)] dynamic RAM (DRAM) cells having surround-gate and double-gate structures. We find that the scaling is limited to the channel length of approximately 25 nm for both types of cells, which is somewhat more pessimistic than previously believed. The mechanisms that are found to be of most importance in imposing the scaling limits are as follows: 1) short-channel effects; 2) quantum confinement of carriers in the body; and 3) band-to-band tunneling at the source/drain-to-body junctions. Like other DRAM cells, practical considerations such as the process variations in cell dimensions, random doping fluctuations, and single-event upsets are likely to remain as important scaling concerns for Z-RAM cells.
Keywords :
random-access storage; band-to-band tunneling; double-gate Z-RAM cells; double-gate structures; dynamic RAM cells; quantum confinement; scaling limits; short-channel effects; single-transistor; source/drain-to-body junctions; surround-gate Z-RAM cells; surround-gate structures; zero-capacitor RAM; Capacitance; Capacitors; DRAM chips; Doping; Fluctuations; Logic; Potential well; Random access memory; Tunneling; Voltage; Capacitorless; double gate; quantum confinement; scaling; simulation; surround gate;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.902691
Filename :
4294187
Link To Document :
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