DocumentCode :
1107093
Title :
An Analytical Model for the Threshold Voltage Shift Caused by Two-Dimensional Quantum Confinement in Undoped Multiple-Gate MOSFETs
Author :
Granzner, Ralf ; Schwierz, Frank ; Polyakov, Vladimir M.
Author_Institution :
Technische Univ. Ilmenau, Ilmenau
Volume :
54
Issue :
9
fYear :
2007
Firstpage :
2562
Lastpage :
2565
Abstract :
An analytical model describing the effects of 2-D quantum-mechanical carrier confinement on the threshold voltage Vth of multiple-gate MOSFETs with rectangular cross section is developed. The model is verified by a comparison with self-consistent solutions of 1-D and 2-D Schroumldinger and Poisson equations. It is shown that: 1) the model results asymptotically approach the case of 1-D confinement in single-gate silicon-on-insulator or double-gate MOSFETs if one body dimension becomes larger than 20 nm and 2) the effect of 2-D confinement is remarkably stronger than a simple combination of two 1-D quantization effects.
Keywords :
MOSFET; semiconductor device models; silicon-on-insulator; 2-D quantum-mechanical carrier confinement; Poisson equation; Schrodinger equation; analytical model; compact modeling; single-gate silicon-on-insulator MOSFET; threshold voltage shift; undoped multiple-gate MOSFET; Analytical models; Carrier confinement; Effective mass; Electrons; MOSFETs; Poisson equations; Potential well; Silicon; Threshold voltage; Two dimensional displays; 2-D quantum confinement; Compact modeling; fin-type field-effect transistor (FinFET); multiple-gate (MG) MOSFETs; threshold voltage; trigate MOSFET;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.902167
Filename :
4294205
Link To Document :
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