DocumentCode :
1107170
Title :
Substrate bias effects on transiently triggered latchup in bulk CMOS
Author :
Chang, Leon ; Berg, John
Author_Institution :
Standard Microsystems Corporation, Hauppauge, NY
Volume :
33
Issue :
1
fYear :
1986
fDate :
1/1/1986 12:00:00 AM
Firstpage :
165
Lastpage :
167
Abstract :
Bulk and p+/p-epitaxial CMOS wafers with and without off-chip substrate bias generation have been examined for latchup immunity to ramped power excitation and transient spike. It is found that a substrate bias applied to a topside contact is more effective than to a backside contact in producing a latchup-free operation. Epitaxial silicon is found to be superior to the nonepitaxial case. A lumped-element model is used to derive the holding voltage and explain the observations.
Keywords :
CMOS process; Circuits; Power measurement; Pulse generation; Pulse measurements; Semiconductor device modeling; Substrates; Testing; Thyristors; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22457
Filename :
1485674
Link To Document :
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