• DocumentCode
    1107275
  • Title

    p-i-n photodiodes made in laser-recrystallized silicon-on-insulator

  • Author

    Colinge, Jean-Pierre

  • Author_Institution
    Hewlett-Packard Laboratories, Palo Alto, CA
  • Volume
    33
  • Issue
    2
  • fYear
    1986
  • fDate
    2/1/1986 12:00:00 AM
  • Firstpage
    203
  • Lastpage
    205
  • Abstract
    Lateral p-i-n photodiodes made in laser-recrystallized silicon-on-insulator are investigated. Dark reverse currents of 0.1 pA/µm are obtained (5-V reverse voltage), as well as an efficiency of more than 5 percent in the green part of the visible spectrum. The influence of a back gate (the mechanical substrate) on the intrinsic zone of the diode is discussed. The carrier lifetime is found to be approximately 8 µs in the intrinsic zone, and the photogenerated current is proportional to incident light power over more than 5 decades.
  • Keywords
    Intelligent sensors; Optical device fabrication; Optical films; P-i-n diodes; PIN photodiodes; Semiconductor films; Sensor phenomena and characterization; Silicon on insulator technology; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22466
  • Filename
    1485683