DocumentCode :
1107275
Title :
p-i-n photodiodes made in laser-recrystallized silicon-on-insulator
Author :
Colinge, Jean-Pierre
Author_Institution :
Hewlett-Packard Laboratories, Palo Alto, CA
Volume :
33
Issue :
2
fYear :
1986
fDate :
2/1/1986 12:00:00 AM
Firstpage :
203
Lastpage :
205
Abstract :
Lateral p-i-n photodiodes made in laser-recrystallized silicon-on-insulator are investigated. Dark reverse currents of 0.1 pA/µm are obtained (5-V reverse voltage), as well as an efficiency of more than 5 percent in the green part of the visible spectrum. The influence of a back gate (the mechanical substrate) on the intrinsic zone of the diode is discussed. The carrier lifetime is found to be approximately 8 µs in the intrinsic zone, and the photogenerated current is proportional to incident light power over more than 5 decades.
Keywords :
Intelligent sensors; Optical device fabrication; Optical films; P-i-n diodes; PIN photodiodes; Semiconductor films; Sensor phenomena and characterization; Silicon on insulator technology; Substrates; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22466
Filename :
1485683
Link To Document :
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