• DocumentCode
    1107398
  • Title

    Very long instruction work architectures and the ELI-512

  • Author

    Fisher, Joseph A.

  • Author_Institution
    Yale Univ., New Haven, CT
  • Volume
    1
  • Issue
    2
  • fYear
    2009
  • Firstpage
    23
  • Lastpage
    33
  • Abstract
    By compiling ordinary scientific applications programs with a radical technique called trace scheduling, we are generating code for a parallel machine that will run these programs faster than an equivalent sequential machine - we expect 10 to 30 times faster. Trace scheduling generates code for machines called very long instruction work architectures. In very long instruction word machines, many statically scheduled, tightly coupled, fine-grained operations exwcute in parallel with a single instruction stream. VLIWs are more parallel extensions of several current architectures. These current architectures have never cracked a fundamental barrier. The speedup they get from parallelism is never more than a factor of 2 to 3. Not htat we couldn´t build more parallel machines of this type: but until trace scheduling we did´t know how to generate code for them. Trace scheduling finds sufficient paralleslism in ordinary code to justify thinking about a highly parallel VLIW. At Yale we are actualy buildingone. Our machine, the ELI-512 has a horizontal instruction word of over 500 bits and will do 10 to 30 RISC-level operations per cyple [Patterson 82]. ELI stands for Enormously Longword Instructions; 512 is the size of the instruction word we hope to achieve. (The current design has a 1200-bit instruction word).
  • Keywords
    parallel architectures; parallel machines; processor scheduling; ELI-512; parallel machine; scientific applications programs; sequential machine; trace scheduling; very long instruction word machines; very long instruction work architectures; Computer architecture; Machinery; Permission; Solid state circuits; Springs; VLIW;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    1943-0582
  • Type

    jour

  • DOI
    10.1109/MSSC.2009.932940
  • Filename
    5116833