DocumentCode :
1107876
Title :
Low-frequency pseudogeneration—Recombination noise of MOSFET´s stressed by channel hot electrons in weak inversion
Author :
Fang, Zhi-Hao
Author_Institution :
University of Wuhan, Wuhan, Peoples Republic of China
Volume :
33
Issue :
4
fYear :
1986
fDate :
4/1/1986 12:00:00 AM
Firstpage :
516
Lastpage :
519
Abstract :
Up to now, the effect of trap distribution over distance in the oxide on low-frequency noise has not been verified experimentally. In this paper, a new method to detect the pseudo-g-r noise, caused by a nonuniform trap distribution, is proposed using MOSFET´s stressed by channel hot electrons. The experimental results are interpreted well by the early given theories and show that the pseudo-g-r noise can be obtained provided that the MOSFET´s are aged sufficiently by electrical stress and operate in weak inversion.
Keywords :
Capacitance; Cutoff frequency; Electron traps; Fluctuations; Low-frequency noise; Noise generators; Noise shaping; Semiconductor device noise; Shape; Stress;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22521
Filename :
1485738
Link To Document :
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