Title :
Low-frequency pseudogeneration—Recombination noise of MOSFET´s stressed by channel hot electrons in weak inversion
Author_Institution :
University of Wuhan, Wuhan, Peoples Republic of China
fDate :
4/1/1986 12:00:00 AM
Abstract :
Up to now, the effect of trap distribution over distance in the oxide on low-frequency noise has not been verified experimentally. In this paper, a new method to detect the pseudo-g-r noise, caused by a nonuniform trap distribution, is proposed using MOSFET´s stressed by channel hot electrons. The experimental results are interpreted well by the early given theories and show that the pseudo-g-r noise can be obtained provided that the MOSFET´s are aged sufficiently by electrical stress and operate in weak inversion.
Keywords :
Capacitance; Cutoff frequency; Electron traps; Fluctuations; Low-frequency noise; Noise generators; Noise shaping; Semiconductor device noise; Shape; Stress;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1986.22521