DocumentCode :
1108808
Title :
A Parabolic Potential Barrier-Oriented Compact Model for the k_{B}T Layer\´s Width in Nano-MOSFETs
Author :
Chen, Ming-Jer ; Lu, Li-Fang
Author_Institution :
Nat. Chiao Tung Univ., Hsinchu
Volume :
55
Issue :
5
fYear :
2008
fDate :
5/1/2008 12:00:00 AM
Firstpage :
1265
Lastpage :
1268
Abstract :
On the basis of a parabolic potential profile around the source-channel junction barrier of nanoscale MOSFETs, a new compact model is physically derived, which links the width of thermal energy kBT layer (a critical zone in the context of the backscattering theory) to the geometrical and bias parameters of the devices. The proposed model is supported by experimental data and by a critical analysis of various simulation works presented in the literature. The only fitting parameter remains constant in a wide range of channel length (10-65 nm), gate voltage (0.4-1.2 V), drain voltage (0.2-1.2 V), and temperature (100 K-500 K). The confusing temperature-dependent issues in the open literature are straightforwardly clarified.
Keywords :
MOSFET; backscatter; nanotechnology; backscattering; channel length; nanometer; nanoscale MOSFET; parabolic potential barrier-oriented compact model; size 10 nm to 65 nm; source-channel junction barrier; temperature 100 K to 500 K; thermal energy layer; voltage 0.4 V to 1.2 V; Analytical models; Backscatter; Context modeling; MOSFET circuits; Nanoscale devices; Solid modeling; Temperature distribution; Thermal conductivity; Voltage; Backscattering; MOSFET; nanometer;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2008.919317
Filename :
4475503
Link To Document :
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