DocumentCode :
1110405
Title :
Calculation of the two-dimensional electron gas density at the AlxGa1-xAs/GaAs heterointerface
Author :
Park, Kwangmean ; Kwack, Kae Dal
Author_Institution :
Hanyang University, Seoul, Korea
Volume :
33
Issue :
11
fYear :
1986
fDate :
11/1/1986 12:00:00 AM
Firstpage :
1831
Lastpage :
1832
Abstract :
Using the Fermi-Dirac statistics and the numerical calculation method, the two-dimensional electron gas density at the unbiased semi-infinite AlxGa1-xAs/GaAs heterointerface is calculated. With the donor concentration, the undoped AlxGa1-xAs layer thickness, the temperature, and some parameters dependent on the Al mole fraction, the results of the numerical calculation show that this brief describes well the characteristics at the heterointerface, and they are in good agreement with the experimental data.
Keywords :
Accuracy; Artificial intelligence; Dielectric constant; Electrons; Gallium arsenide; Impurities; Ionization; Poisson equations; Statistics; Temperature dependence;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22751
Filename :
1485968
Link To Document :
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