• DocumentCode
    1110734
  • Title

    IIIB-2 The fabrication submicrometer MOSFET´s using laser doping

  • Author

    Bezjian, K. ; Simon, Terry W. ; Magee, T.

  • Volume
    33
  • Issue
    11
  • fYear
    1986
  • fDate
    11/1/1986 12:00:00 AM
  • Firstpage
    1847
  • Lastpage
    1847
  • Keywords
    Boron; Doping; Electron devices; Gas lasers; Implants; Laser beams; MOSFETs; Optical device fabrication; Optical pulses; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22782
  • Filename
    1485999