Title :
IIIB-5 recessed Silo—A submicrometer VLSI isolation technology
Author :
Hui, John ; Voorde, P.V. ; Moll, Jonas
fDate :
11/1/1986 12:00:00 AM
Keywords :
Anisotropic magnetoresistance; Etching; Isolation technology; Laboratories; Lithography; MOSFET circuits; Oxidation; Silicon; Transconductance; Very large scale integration;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1986.22785
