DocumentCode :
1111482
Title :
The SINFET—A Schottky injection MOS-gated power transistor
Author :
Sin, Johnny K O ; Salama, C. Andre T ; Hou, Li-zhang
Author_Institution :
University of Toronto, Toronto, Canada
Volume :
33
Issue :
12
fYear :
1986
fDate :
12/1/1986 12:00:00 AM
Firstpage :
1940
Lastpage :
1947
Abstract :
A new MOS-gated power device, the Schottky injection FET (SINFET), is described in this paper. The device offers 6 times higher current handling capability than conventional n-channel power LDMOS transistors of comparable size and voltage capability and still maintains a comparable switching speed. The low on-resistance is obtained by conductivity modulation of the high-resistivity n- drift region using a Schottky injector. Since only a small number of minority carriers are injected, the speed of the device is not degraded substantially and high latchup resistance is achieved. Breakdown voltages and specific on-resistance observed on typical devices are 170 V and 0.01 Ω . cm2, respectively. Gate-turn off times are of the order of 30 ns. Two-dimensional simulation and experimental results comparing the SIN-FET with the LDMOST and lateral insulated gate transistor (LIGT) are presented.
Keywords :
Anodes; Application specific integrated circuits; Conductivity; Degradation; FETs; MOSFETs; Power transistors; Schottky barriers; Silicon compounds; Voltage control;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22850
Filename :
1486067
Link To Document :
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