• DocumentCode
    1111482
  • Title

    The SINFET—A Schottky injection MOS-gated power transistor

  • Author

    Sin, Johnny K O ; Salama, C. Andre T ; Hou, Li-zhang

  • Author_Institution
    University of Toronto, Toronto, Canada
  • Volume
    33
  • Issue
    12
  • fYear
    1986
  • fDate
    12/1/1986 12:00:00 AM
  • Firstpage
    1940
  • Lastpage
    1947
  • Abstract
    A new MOS-gated power device, the Schottky injection FET (SINFET), is described in this paper. The device offers 6 times higher current handling capability than conventional n-channel power LDMOS transistors of comparable size and voltage capability and still maintains a comparable switching speed. The low on-resistance is obtained by conductivity modulation of the high-resistivity n- drift region using a Schottky injector. Since only a small number of minority carriers are injected, the speed of the device is not degraded substantially and high latchup resistance is achieved. Breakdown voltages and specific on-resistance observed on typical devices are 170 V and 0.01 Ω . cm2, respectively. Gate-turn off times are of the order of 30 ns. Two-dimensional simulation and experimental results comparing the SIN-FET with the LDMOST and lateral insulated gate transistor (LIGT) are presented.
  • Keywords
    Anodes; Application specific integrated circuits; Conductivity; Degradation; FETs; MOSFETs; Power transistors; Schottky barriers; Silicon compounds; Voltage control;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22850
  • Filename
    1486067