DocumentCode
1112137
Title
Inverted GaAs/AlGaAs modulation-doped field-effect transistors with extremely high transconductances
Author
Cirillo, Nicholas C., Jr. ; Shur, Michael S. ; Abrokwah, Jonathan K.
Author_Institution
Physical Sciences Center, Honeywell Inc., Bloomington, MN
Volume
7
Issue
2
fYear
1986
fDate
2/1/1986 12:00:00 AM
Firstpage
71
Lastpage
74
Abstract
Inverted GaAs/AsGaAs MODFET´s with transconductances as high as 1810 mS/mm at 77 K and 1180 mS/mm at 300 K are fabricated using a self-aligned process. The devices have the gate-heterojunction interface spacing of only 100 Å, and the observed values of the transconductance are limited primarily by the source series resistance and by the gate current. The MODFET characteristics are interpreted using the charge control velocity saturation model which takes into account the gate current. The obtained results show a great potential of inverted MODFET´s for ultrahigh-speed applications.
Keywords
Epitaxial layers; FETs; Gallium arsenide; HEMTs; Heterojunctions; MODFET circuits; Parasitic capacitance; Propagation delay; Transconductance; Velocity control;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1986.26298
Filename
1486121
Link To Document