• DocumentCode
    1112137
  • Title

    Inverted GaAs/AlGaAs modulation-doped field-effect transistors with extremely high transconductances

  • Author

    Cirillo, Nicholas C., Jr. ; Shur, Michael S. ; Abrokwah, Jonathan K.

  • Author_Institution
    Physical Sciences Center, Honeywell Inc., Bloomington, MN
  • Volume
    7
  • Issue
    2
  • fYear
    1986
  • fDate
    2/1/1986 12:00:00 AM
  • Firstpage
    71
  • Lastpage
    74
  • Abstract
    Inverted GaAs/AsGaAs MODFET´s with transconductances as high as 1810 mS/mm at 77 K and 1180 mS/mm at 300 K are fabricated using a self-aligned process. The devices have the gate-heterojunction interface spacing of only 100 Å, and the observed values of the transconductance are limited primarily by the source series resistance and by the gate current. The MODFET characteristics are interpreted using the charge control velocity saturation model which takes into account the gate current. The obtained results show a great potential of inverted MODFET´s for ultrahigh-speed applications.
  • Keywords
    Epitaxial layers; FETs; Gallium arsenide; HEMTs; Heterojunctions; MODFET circuits; Parasitic capacitance; Propagation delay; Transconductance; Velocity control;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1986.26298
  • Filename
    1486121