DocumentCode :
1112180
Title :
Transit time and charge storage measurements in heavily doped emitters
Author :
Neugroschel, Arnost ; Hwang, B.Y. ; Park, J.S.
Author_Institution :
University of Florida, Gainesville, FL
Volume :
7
Issue :
2
fYear :
1986
fDate :
2/1/1986 12:00:00 AM
Firstpage :
83
Lastpage :
85
Abstract :
We report results of a first direct measurement of the minority-carrier transit time in a transparent heavily doped emitter layer. The value was obtained by a high-frequency conductance method recently developed and used for low-doped Si. The transit time coupled with the steady-state current enables the determination of the quasi-static charge stored in the emitter and the quasi-static emitter capacitance. Using a transport model, we estimated, from the measured transit time, the value for the minority-carrier diffusion coefficient and mobility. The measurements were done using a heavily doped emitter of the Si p+-n-p bipolar transistor. The new result indicates that the position-averaged minority-carrier diffusion coefficients may be much smaller than the corresponding majority-carrier values for emitters having a concentration ranging from about 3 × 1019cm-3to 1020cm-3.
Keywords :
Bipolar transistors; Capacitance; Charge measurement; Current measurement; Electron emission; Frequency; Radiative recombination; Spontaneous emission; Steady-state; Time measurement;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1986.26302
Filename :
1486125
Link To Document :
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