Title : 
44-GHz monolithic GaAs FET amplifier
         
        
            Author : 
Kim, B. ; Tserng, H.Q. ; Shih, H.D.
         
        
            Author_Institution : 
Texas Instruments Incorporated, Central Research Laboratories, Dallas, TX
         
        
        
        
        
            fDate : 
2/1/1986 12:00:00 AM
         
        
        
        
            Abstract : 
Millimeter-wave monolithic GaAs FET amplifiers have been developed. These amplifiers were fabricated using FET´s with MBE-grown active layers and electron-beam defined sub-half-micrometer gates. Source groundings are provided through very low inductance via holes. The single-stage amplifier has achieved over a 10-dB gain at 44 GHz. A 300-µm gate-width amplifier has achieved an output power of 60 mW with a power density of 0.2 W per millimeter of gate width.
         
        
            Keywords : 
Epitaxial layers; Etching; FETs; Fabrication; Gallium arsenide; Grounding; Inductance; Millimeter wave circuits; Millimeter wave technology; Power amplifiers;
         
        
        
            Journal_Title : 
Electron Device Letters, IEEE
         
        
        
        
        
            DOI : 
10.1109/EDL.1986.26306