DocumentCode
1112919
Title
A vertical Kelvin test structure for measuring the true pecific contact resistivity
Author
Lei, Tan Fu ; Leu, Len-Yi ; Lee, Chung Len
Author_Institution
National Chiao Tung University, Hsin Chu, Taiwan, Republic of China
Volume
7
Issue
4
fYear
1986
fDate
4/1/1986 12:00:00 AM
Firstpage
259
Lastpage
261
Abstract
A vertical Kelvin test structure, which can be used to measure the true specific contact resistivity of a metallization system, is proposed and studied. For this test structure, the driving current flows "vertically," thus the sheet resistance and current crowding effects are eliminated and measurement on the true specific contact resistivity becomes possible. Experimental works show that this test structure gives a more linear relation between resistance and contact area than the conventional six-terminal test structure.
Keywords
Area measurement; Conductivity; Contact resistance; Current measurement; Electrical resistance measurement; Kelvin; Metallization; Proximity effect; System testing; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1986.26365
Filename
1486188
Link To Document