DocumentCode
1113030
Title
Focused ion beam microsurgery for electronics
Author
Musil, Christian R. ; Bartelt, John L. ; Melngailis, John
Author_Institution
Hughes Research Laboratories, Malibu, CA
Volume
7
Issue
5
fYear
1986
fDate
5/1/1986 12:00:00 AM
Firstpage
285
Lastpage
287
Abstract
Methods of making and breaking connections on an Al conductor test pattern using a focused ion beam (FIB) are demonstrated. Submicrometer dimension connections between crossing conductors separated by oxide were fabricated in 7 s. Resistances of the connections were measured to be 3 Ω and were tested up to 50 mA. Milled cuts in 0.65- µm-thick 10-µm-wide conductors produced open-circuit resistances > 20 MΩ in 300 s. The combined imaging, restructuring, and verification capability of FIB microsurgery is shown.
Keywords
Artificial intelligence; Conductors; Electrical resistance measurement; Focusing; Ion beams; Laboratories; Microsurgery; Milling machines; Surgery; Testing;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1986.26375
Filename
1486198
Link To Document