• DocumentCode
    1113290
  • Title

    Reduction of extrinsic base resistance in GaAs/AlGaAs heterojunction bipolar transistors and correlation with high-frequency performance

  • Author

    Fischer, R. ; Morkoç, Hadis

  • Author_Institution
    University of Illinois at Urbana-Champaign, Urbana, IL
  • Volume
    7
  • Issue
    6
  • fYear
    1986
  • fDate
    6/1/1986 12:00:00 AM
  • Firstpage
    359
  • Lastpage
    362
  • Abstract
    Improved high-frequency performance in GaAs/AlGaAs heterojunction bipolar transistors (HBT\´s) by reduction of extrinsic base resistance is demonstrated. A new self-aligned process which is very simple, yet capable of producing 0.25-µm emitter-to-base contact gaps, is described. By the use of AuBe, we have also been able to produce contact resistances to p-type GaAs (p = 5 × 1018) as low as 1.2 × 10-7Ω.cm2. This is the lowest value reported to p-type GaAs considering the relatively low doping levels used. By employing these techniques, we have produced HBT\´s with 2.5-µm-wide emitters having current gain cutoff frequencies fTthat appear to be greater than 35 GHz and maximum oscillation frequencies f_{\\max } of 22 GHz.
  • Keywords
    Cutoff frequency; Delay; Doping; Epitaxial growth; Etching; Fabrication; Gallium arsenide; Geometry; Heterojunction bipolar transistors; Ring oscillators;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1986.26400
  • Filename
    1486223