• DocumentCode
    1114228
  • Title

    Real-space transfer and hot-electron transport properties in III-V semiconductor heterostructures

  • Author

    Sakamoto, Ryoji ; Akai, Kiyoyasu ; Inoue, Masataka

  • Author_Institution
    Dept. of Electr. Eng., Osaka Inst. of Technol., Japan
  • Volume
    36
  • Issue
    10
  • fYear
    1989
  • fDate
    10/1/1989 12:00:00 AM
  • Firstpage
    2344
  • Lastpage
    2352
  • Abstract
    Real-space transfer (RST) of hot electrons in heterostructures was studied using Monte Carlo simulations. Hot-electron distributions in real space were determined self-consistently by taking into account the space-charge field across the heterointerface. Using the analysis of hot-electron distributions in heterostructures, high-field transport properties are discussed from the viewpoint of heterostructure engineering. The simulations indicate that the effects of real-space transfer are strongly dependent on the energy band structure, doping density, and heterostructure parameters. It is also shown that InGaAs/InP is superior to GaAs/AlGaAs in terms of obtaining high velocity because RST reduces hot-electron distributions in the L and X valleys of InGaAs and increases the electron population in the Γ valley of InP. This is due to the suitable valley line-up in the InGaAs/InP heterostructure
  • Keywords
    III-V semiconductors; Monte Carlo methods; high field effects; hot carriers; semiconductor junctions; space charge; GaAs-AlGaAs; III-V semiconductor heterostructures; InGaAs-InP; Monte Carlo simulations; doping density; electron population; energy band structure; heterostructure engineering; high-field transport properties; hot-electron distributions; hot-electron transport properties; real space transfer; space-charge field; Chemical technology; Conductivity; Electron emission; Epitaxial layers; Gallium arsenide; III-V semiconductor materials; Indium gallium arsenide; Indium phosphide; Power engineering and energy; Thermionic emission;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.40920
  • Filename
    40920