DocumentCode :
1114418
Title :
Measurement and analysis of photocurrent transient characteristics for hydrogenated amorphous-silicon photodiodes
Author :
Nozaki, H. ; Kamimura, T. ; Sakuma, N. ; Ito, H.
Author_Institution :
Toshiba Corp., Kawasaki, Japan
Volume :
36
Issue :
12
fYear :
1989
fDate :
12/1/1989 12:00:00 AM
Firstpage :
2810
Lastpage :
2815
Abstract :
The relations between the photocurrent transient after the end of steady-state illumination for hydrogenated amorphous silicon photodiodes and the related film properties for undoped hydrogenated amorphous silicon prepared by mercury-sensitized photochemical vapor deposition are investigated. The photocurrent transient characteristic indicates significant correlations with the film properties, such as electron drift mobility (μd), silicon dangling bond density (N s), a minimum in the density of states near the Fermi level (Nmin), and space-charge density (N i). The photocurrent transient decay decreases with increasing μd and with decreasing Ns, Mmin, and Ni. This result was confirmed by a model analysis
Keywords :
amorphous semiconductors; carrier mobility; dangling bonds; electronic density of states; elemental semiconductors; hydrogen; photoconductivity; photodiodes; semiconductor device models; silicon; transients; Fermi level; Hg sensitised chemical vapour deposition; Si:H photodiodes; amorphous semiconductors; dangling bond density; density of states; electron drift mobility; film properties; model analysis; photocurrent transient characteristics; photocurrent transient decay; space-charge density; Amorphous silicon; Chemical vapor deposition; Electron mobility; Lighting; Photochemistry; Photoconductivity; Photodiodes; Semiconductor films; Steady-state; Transient analysis;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.40942
Filename :
40942
Link To Document :
بازگشت