DocumentCode :
1114481
Title :
Small angle X-ray scattering from microvoids in the a-SiC:H alloy
Author :
Mahan, A.H. ; Nelson, B.P. ; Crandall, R.S. ; Williamson, D.L.
Author_Institution :
Solar Energy Res. Inst., Golden, CO, USA
Volume :
36
Issue :
12
fYear :
1989
fDate :
12/1/1989 12:00:00 AM
Firstpage :
2859
Lastpage :
2862
Abstract :
Small-angle X-ray scattering (SAXS) measurements on a series of a-SiC:H alloy films deposited in a glow discharge reactor using SiH4/CH4 gas mixtures are discussed. It was found that the introduction of C into the a-Si matrix produces a large SAXS signal, which suggests a sizable microvoid density, and which further increases with increasing C content. A Guinier analysis shows that these microvoids are spherical and have an average radius of approximately 6 Å, which increases only slightly with C content. Other measurements (infrared, photoconductivity, film density, optical) made on identically prepared material are included to identify the possible origins of these microvoids and to determine how they affect material quality
Keywords :
X-ray scattering; amorphous semiconductors; electrical conductivity of amorphous semiconductors and insulators; hydrogen; infrared spectra of inorganic solids; noncrystalline state structure; photoconductivity; photothermal spectroscopy; plasma CVD coatings; silicon compounds; voids (solid); Guinier analysis; IR spectra; SiC:H film; SiH4; SiH4-methane gas mixture; amorphous semiconductor; film density; glow discharge reactor; material quality; microvoid density; photoconductivity; photothermal deflection spectroscopy; small angle X-ray scattering; Density measurement; Glow discharges; Microstructure; Optical films; Optical materials; Optical scattering; Photoconducting materials; Photoconductivity; Radio frequency; X-ray scattering;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.40947
Filename :
40947
Link To Document :
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