DocumentCode :
1114561
Title :
Fabrication of inversion-type n-channel MOSFET´s using cubic-SiC on Si
Author :
Shibahara, K. ; Saito, T. ; Nishino, S. ; Matsunami, H. ; Matsunami, H.
Author_Institution :
Kyoto University, Sakyo, Kyoto, Japan
Volume :
7
Issue :
12
fYear :
1986
fDate :
12/1/1986 12:00:00 AM
Firstpage :
692
Lastpage :
693
Abstract :
Inversion-type n-channel MOSFET´s of cubic-SiC were successfully fabricated. Cubic-SiC was grown on Si
Keywords :
Crystals; Fabrication; Ion implantation; Lattices; Oxidation; P-n junctions; Schottky barriers; Silicon carbide; Substrates; Temperature;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1986.26522
Filename :
1486345
Link To Document :
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